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Proceedings Paper

Direct to digital holography for semiconductor wafer defect detection and review
Author(s): C. E. Thomas; Tracy M. Bahm; Larry R. Baylor; Philip R. Bingham; Steven W. Burns; Matt Chidley; Long Dai; Robert J. Delahanty; Christopher J. Doti; Ayman El-Khashab; Robert L. Fisher; Judd M. Gilbert; James S. Goddard; Gregory R. Hanson; Joel D. Hickson; Martin A. Hunt; Kathy W. Hylton; George C. John; Michael L. Jones; Ken R. Macdonald; Michael W. Mayo; Ian McMackin; Dave R. Patek; John H. Price; David A. Rasmussen; Louis J. Schaefer; Thomas R. Scheidt; Mark A. Schulze; Philip D. Schumaker; Bichuan Shen; Randall G. Smith; Allen N. Su; Kenneth W. Tobin; William R. Usry; Edgar Voelkl; Karsten S. Weber; Paul G. Jones; Robert W. Owen
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Paper Abstract

A method for recording true holograms directly to a digital video medium in a single image has been invented. This technology makes the amplitude and phase for every pixel of the target object wave available. Since phase is proportional wavelength, this makes high-resolution metrology an implicit part of the holographic recording. Measurements of phase can be made to one hundredth or even one thousandth of a wavelength, so the technology is attractive for dining defects on semiconductor wafers, where feature sizes are now smaller than the wavelength of even deep UV light.

Paper Details

Date Published: 12 July 2002
PDF: 15 pages
Proc. SPIE 4692, Design, Process Integration, and Characterization for Microelectronics, (12 July 2002); doi: 10.1117/12.475659
Show Author Affiliations
C. E. Thomas, nLine Corp. (United States)
Tracy M. Bahm, nLine Corp. (United States)
Larry R. Baylor, Oak Ridge National Lab. (United States)
Philip R. Bingham, Oak Ridge National Lab. (United States)
Steven W. Burns, nLine Corp. (United States)
Matt Chidley, Oak Ridge National Lab. (United States)
Long Dai, nLine Corp. (United States)
Robert J. Delahanty, nLine Corp. (United States)
Christopher J. Doti, nLine Corp. (United States)
Ayman El-Khashab, nLine Corp. (United States)
Robert L. Fisher, nLine Corp. (United States)
Judd M. Gilbert, nLine Corp. (United States)
James S. Goddard, Oak Ridge National Lab. (United States)
Gregory R. Hanson, Oak Ridge National Lab. (United States)
Joel D. Hickson, nLine Corp. (United States)
Martin A. Hunt, nLine Corp. (United States)
Kathy W. Hylton, Oak Ridge National Lab. (United States)
George C. John, nLine Corp. (United States)
Michael L. Jones, nLine Corp. (United States)
Ken R. Macdonald, nLine Corp. (United States)
Michael W. Mayo, nLine Corp. (United States)
Ian McMackin, nLine Corp. (United States)
Dave R. Patek, Oak Ridge National Lab. (United States)
John H. Price, nLine Corp. (United States)
David A. Rasmussen, Oak Ridge National Lab. (United States)
Louis J. Schaefer, nLine Corp. (United States)
Thomas R. Scheidt, nLine Corp. (United States)
Mark A. Schulze, nLine Corp. (United States)
Philip D. Schumaker, nLine Corp. (United States)
Bichuan Shen, nLine Corp. (United States)
Randall G. Smith, nLine Corp. (United States)
Allen N. Su, nLine Corp. (United States)
Kenneth W. Tobin, Oak Ridge National Lab. (United States)
William R. Usry, nLine Corp. (United States)
Edgar Voelkl, nLine Corp. (United States)
Karsten S. Weber, nLine Corp. (United States)
Paul G. Jones, nLine Corp. (United States)
Robert W. Owen, nLine Corp. (United States)

Published in SPIE Proceedings Vol. 4692:
Design, Process Integration, and Characterization for Microelectronics
Alexander Starikov; Kenneth W. Tobin; Alexander Starikov, Editor(s)

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