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Proceedings Paper

Fabrication of multimode polymeric waveguides and micromirrors using UV and X-ray lithography
Author(s): Joon-Sung Kim; Jae-Wook Kang; Jang-Joo Kim
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Paper Abstract

Polymeric optical multimode waveguides have been fabricated by UV and X-ray lithography for optical interconnects. A UV-curable epoxy based polymer (SU-8) was used for VU contact printing. The material has low optical loss and is thermally stable up to 200°C. Polymethylacralate (PMMA) was used as the core layer which is a positive x-ray resist and optically transparent in visible and near IR region. The propagation loss of the fabricated multimode waveguides by the UV contact printing method was 0.36 dB/cm. Waveguide losses of 0.33 dB/cm at 633 nm and 0.54 dB/cm at 830 nm was obtained using PMMA waveguides fabricated by x-ray lithography. The losses of micromirrors were as low as 0.43 dB at both wavelengths.

Paper Details

Date Published: 14 July 2003
PDF: 8 pages
Proc. SPIE 4991, Organic Photonic Materials and Devices V, (14 July 2003); doi: 10.1117/12.475461
Show Author Affiliations
Joon-Sung Kim, Kwangju Institute of Science and Technology (South Korea)
Jae-Wook Kang, Kwangju Institute of Science and Technology (South Korea)
Jang-Joo Kim, Kwangju Institute of Science and Technology (South Korea)


Published in SPIE Proceedings Vol. 4991:
Organic Photonic Materials and Devices V
James G. Grote; Toshikuni Kaino, Editor(s)

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