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Proceedings Paper

Space station atomic-oxygen-resistant coatings
Author(s): James L. Grieser; Alan W. Freeland; Jeffrey D. Fink; Gary E. Meinke; Eugene N. Hildreth
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Paper Abstract

A Low Earth Orbit (LEO) Atomic Oxygen Resistant (AOR) thin film coating has been developed by Sheldahl Inc. for use on the Space Station Freedont Photo Voltaic Solar Array Panels. The AOR silicon oxide (SiOx) coating was developed in a irianufacturing system and lends itself to reasonably large production quantities. Test results of the SiOx coating on polyiinide versus uncoated polyiiaide are presented along with a discussion of the nanufacturing process used. The substrate used for this program was Dupont type H Kapton! The major areas of testing were environnental survivability (atomic oxygen resistance optical properties and thermal shock) and physical/mechanical characterization (adhesion blocking flexibility and abrasion resistance). 2.

Paper Details

Date Published: 1 January 1991
PDF: 9 pages
Proc. SPIE 1330, Optical Surfaces Resistant to Severe Environments, (1 January 1991); doi: 10.1117/12.47522
Show Author Affiliations
James L. Grieser, Sheldahl, Inc. (United States)
Alan W. Freeland, Sheldahl, Inc. (United States)
Jeffrey D. Fink, Sheldahl, Inc. (United States)
Gary E. Meinke, Sheldahl, Inc. (United States)
Eugene N. Hildreth, Sheldahl, Inc. (United States)


Published in SPIE Proceedings Vol. 1330:
Optical Surfaces Resistant to Severe Environments
Solomon Musikant, Editor(s)

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