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Proceedings Paper

Implementation of phase-shift focus monitor with modified illumination
Author(s): Shuji Nakao; Shinroku Maejima; Atsushi Ueno; Shigenori Yamashita; Junji Miyazaki; Akira Tokui; Kouichirou Tsujita; Ichiriou Arimoto
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Paper Abstract

For the convenience of practical use of phase shift focus monitor (PSFM), which has been developed by T. Brunner, imaging characteristics of PSFM are investigated under modified illumination by optical image calculations and printing experiments. Although the mechanism of pattern shift with focus offset under modified illumination is different from that for conventional high coherent illumination, sufficient sensitivity for precise focus monitoring is predicted by optical image calculations. Also, it is revealed that reduction of NA, i.e., localizing illumination at the peripheral part of pupil is effective to obtain higher sensitivity. By experiments, predicted characteristics are observed and similar sensitivity to that in conventional high coherent illumination is confirmed both for annular and quadrupole illuminations.

Paper Details

Date Published: 30 July 2002
PDF: 9 pages
Proc. SPIE 4691, Optical Microlithography XV, (30 July 2002); doi: 10.1117/12.474643
Show Author Affiliations
Shuji Nakao, Mitsubishi Electric Corp. (Japan)
Shinroku Maejima, Mitsubishi Electric Corp. (Japan)
Atsushi Ueno, Mitsubishi Electric Corp. (Japan)
Shigenori Yamashita, Mitsubishi Electric Corp. (Japan)
Junji Miyazaki, Mitsubishi Electric Corp. (Japan)
Akira Tokui, Mitsubishi Electric Corp. (Japan)
Kouichirou Tsujita, Mitsubishi Electric Corp. (Japan)
Ichiriou Arimoto, Mitsubishi Electric Corp. (Japan)


Published in SPIE Proceedings Vol. 4691:
Optical Microlithography XV
Anthony Yen, Editor(s)

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