Share Email Print
cover

Proceedings Paper

Development of environmental control technologies for 157-nm lithography at ASET
Author(s): Yasuaki Fukuda; Seiji Takeuchi; Takashi Aoki; Hiroyuki Nagasaka; Soichi Owa; Fumika Yoshida; Youichi Kawasa; Keiji Egawa; Takehito Watanabe; Ikuo Uchino; Akira Sumitani; Kiyoharu Nakao
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

Purging and reduction of out-gassing are very important issues that need to be treated in order to realize F2 laser lithography system. Several methods of purging are tried and out-gases from metals, O-rings, lubricants, and an adhesive are analyzed. Metal surfaces mainly release oxygen and water independent of surface roughness, Ni plating, or elements. Other substances are not detected by API-MS or GC-MS. Since O-rings are indispensable to make gas-tight structures, several kinds of O-rings made of fluoro-compounds are tested. Black fluoro-rubber o-ring, O-ring F, is recommended from the view of organic out-gassing but Teflon-based fluoro-elastomer, O-ring A, is a good candidate in terms of the water out-gassing. Greases emit a large amount of out-gases even when the samples are not irradiated by 157 nm laser. As an adhesive, Adhesive A is recommended because of the fact that it does not release as much organic and inorganic compounds which may absorb 157 nm laser light. Finally preliminary demonstration using a model exposure system is performed to obtain purging time for several cases.

Paper Details

Date Published: 30 July 2002
PDF: 12 pages
Proc. SPIE 4691, Optical Microlithography XV, (30 July 2002); doi: 10.1117/12.474622
Show Author Affiliations
Yasuaki Fukuda, Association of Super-Advanced Electronics Technologies (Japan)
Seiji Takeuchi, Association of Super-Advanced Electronics Technologies (Japan)
Takashi Aoki, Association of Super-Advanced Electronics Technologies (Japan)
Hiroyuki Nagasaka, Association of Super-Advanced Electronics Technologies (Japan)
Soichi Owa, Association of Super-Advanced Electronics Technologies (Japan)
Fumika Yoshida, Association of Super-Advanced Electronics Technologies (Japan)
Youichi Kawasa, Association of Super-Advanced Electronics Technologies (Japan)
Keiji Egawa, Association of Super-Advanced Electronics Technologies (Japan)
Takehito Watanabe, Association of Super-Advanced Electronics Technologies (Japan)
Ikuo Uchino, Association of Super-Advanced Electronics Technologies (Japan)
Akira Sumitani, Association of Super-Advanced Electronics Technologies (Japan)
Kiyoharu Nakao, Association of Super-Advanced Electronics Technologies (Japan)


Published in SPIE Proceedings Vol. 4691:
Optical Microlithography XV
Anthony Yen, Editor(s)

© SPIE. Terms of Use
Back to Top