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Proceedings Paper

Development of a 5-kHz ultra-line-narrowed F2 laser for dioptric projection systems
Author(s): Tatsuya Ariga; Hidenori Watanabe; Takahito Kumazaki; Naoki Kitatochi; Kotaro Sasano; Yoshifumi Ueno; Masayuki Konishi; Takashi Suganuma; Masaki Nakano; Toshio Yamashita; Toshihiro Nishisaka; Ryoichi Nohdomi; Kazuaki Hotta; Hakaru Mizoguchi; Kiyoharu Nakao
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Paper Abstract

The roadmap of semiconductor fabrication predicts that the semiconductor market will demand 65 nm node devices from 2004/2005. Therefore, an Ultra-Line-Narrowed F2 laser for dioptric projection systems is currently being developed under the ASET project of The F2 Laser Lithography Development Project. The target of this project is to achieve a F2 laser spectral bandwidth below 0.2 pm (FWHM) and an average power of 25 W at a repetition rate of 5 kHz. The energy stability (3-sigma) target is less than 10%. An Oscillator-Amplifier arrangement at 2 kHz was developed as a first step of an Ultra-Line-Narrowed F2 laser system. With this laser system, we did the basic study of the synchronization technology for line narrowing operation using two system arrangements: MOPA (Master Oscillator/Power Amplifier) and Injection Locking. Based on this experience we have developed the 5 kHz system. With the 5 kHz Line-Narrowed Injection Locking system, we have achieved a spectral bandwidth of < 0.2 pm with an output energy of > 5 mJ and an energy pulse to pulse stability of 10%. The feasibility of a 5 kHz Ultra-Line-Narrowed F2 Laser for Dioptric Projection Systems has been demonstrated.

Paper Details

Date Published: 30 July 2002
PDF: 8 pages
Proc. SPIE 4691, Optical Microlithography XV, (30 July 2002); doi: 10.1117/12.474613
Show Author Affiliations
Tatsuya Ariga, Association of Super-Advanced Electronics Technologies (Japan)
Hidenori Watanabe, Association of Super-Advanced Electronics Technologies (Japan)
Takahito Kumazaki, Association of Super-Advanced Electronics Technologies (Japan)
Naoki Kitatochi, Association of Super-Advanced Electronics Technologies (Japan)
Kotaro Sasano, Association of Super-Advanced Electronics Technologies (Japan)
Yoshifumi Ueno, Association of Super-Advanced Electronics Technologies (Japan)
Masayuki Konishi, Association of Super-Advanced Electronics Technologies (Japan)
Takashi Suganuma, Association of Super-Advanced Electronics Technologies (Japan)
Masaki Nakano, Association of Super-Advanced Electronics Technologies (Japan)
Toshio Yamashita, Association of Super-Advanced Electronics Technologies (Japan)
Toshihiro Nishisaka, Association of Super-Advanced Electronics Technologies (Japan)
Ryoichi Nohdomi, Association of Super-Advanced Electronics Technologies (Japan)
Kazuaki Hotta, Association of Super-Advanced Electronics Technologies (Japan)
Hakaru Mizoguchi, Association of Super-Advanced Electronics Technologies (Japan)
Kiyoharu Nakao, Association of Super-Advanced Electronics Technologies (Japan)


Published in SPIE Proceedings Vol. 4691:
Optical Microlithography XV
Anthony Yen, Editor(s)

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