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Proceedings Paper

157-nm technology: Where are we today?
Author(s): Jan Mulkens; Thomas J. Fahey; James A. McClay; Judon M. D. Stoeldraijer; Patrick Wong; Martin Brunotte; Birgit Mecking
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Paper Details

Date Published: 30 July 2002
PDF: 13 pages
Proc. SPIE 4691, Optical Microlithography XV, (30 July 2002); doi: 10.1117/12.474610
Show Author Affiliations
Jan Mulkens, ASML (Netherlands)
Thomas J. Fahey, ASML (United States)
James A. McClay, ASML (United States)
Judon M. D. Stoeldraijer, ASML (Netherlands)
Patrick Wong, ASML (Belgium)
Martin Brunotte, Carl Zeiss (Germany)
Birgit Mecking, Carl Zeiss (Germany)


Published in SPIE Proceedings Vol. 4691:
Optical Microlithography XV
Anthony Yen, Editor(s)

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