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Proceedings Paper

Desirable reticle flatness from focus deviation standpoint optical lithography
Author(s): Soichi Inoue; Masamitsu Itoh; Masafumi Asano; Katsuya Okumura; Tsuneyuki Hagiwara; Jiro Moriya
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Paper Abstract

We performed precise and systematic approaches for clarifying what reticle flatness should be from the standpoint of focal deviation in optical lithography. The impact of reticle warpage on focus deviation was measured by aerial image sensor to obtain tiny reticle-induced focus shift precisely. We clarified the criteria of reticle flatness after chucking. Optimum free-standing shape to become desired shape after chucking was obtained by simulation and analytical approach. The flatness of chucked reticle was found to be determined by both free-standing plate shape inside the reticle holder and plate shape facing the holder. Reticle flatness was newly defined according to the results. Requirements respecting the newly defined flatness for each technology node were clarified from focus budget analysis.

Paper Details

Date Published: 30 July 2002
PDF: 11 pages
Proc. SPIE 4691, Optical Microlithography XV, (30 July 2002); doi: 10.1117/12.474600
Show Author Affiliations
Soichi Inoue, Toshiba Corp. (Japan)
Masamitsu Itoh, Toshiba Corp. (Japan)
Masafumi Asano, Toshiba Corp. (Japan)
Katsuya Okumura, Toshiba Corp. (Japan)
Tsuneyuki Hagiwara, Nikon Corp. (Japan)
Jiro Moriya, Shin-Etsu Chemical Co., Ltd. (Japan)

Published in SPIE Proceedings Vol. 4691:
Optical Microlithography XV
Anthony Yen, Editor(s)

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