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Proceedings Paper

Attainable road to the lower-k1 extension using high-transmittance attenuated phase-shifting mask in the KrF lithography world
Author(s): Insung Kim; Sung-gon Jung; Hyung-Do Kim; Gisung Yeo; In-Gyun Shin; Junghyun Lee; Hanku Cho; Joo-Tae Moon
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Paper Abstract

KrF lithography around 0.3k1 was studied using high transmittance attenuated phase shifting mask(att.PSM). Although gradual transition to the more high NA KrF scanner or ArF scanner takes place, the strong requests for the timely process development to keep up with the rapid shrinkage of device drive the extension of lithography technology to the lower k1; 0.3 or even below. Under the given illumination condition, aerial image contrasts for varying design rules(D/R) can be related to the transmittance of att.PSM. In other words, there exists an optimum mask transmittance for each D/R, from which we try to seek the feasible way of extension to the lower k1. We will cover the EL(Exposure Latitude), the MEEF(Mask Error Enhancement Factor), and also discuss an interesting behavior of the N-M offset in utilizing high transmittance att.PSM in the low k1 node. We used the att.PSM of 20% transmittance, as a special case experiment, to investigate the effect of high transmittance around 0.3k1 lithography. This study may facilitate the application of high transmittance att.PSM to the lower k1 and contribute to extending the lifetime of optical lithography.

Paper Details

Date Published: 30 July 2002
PDF: 10 pages
Proc. SPIE 4691, Optical Microlithography XV, (30 July 2002); doi: 10.1117/12.474595
Show Author Affiliations
Insung Kim, Samsung Electronics Co., Ltd. (South Korea)
Sung-gon Jung, Samsung Electronics Co., Ltd. (South Korea)
Hyung-Do Kim, Samsung Electronics Co., Ltd. (South Korea)
Gisung Yeo, Samsung Electronics Co., Ltd. (South Korea)
In-Gyun Shin, Samsung Electronics Co., Ltd. (South Korea)
Junghyun Lee, Samsung Electronics Co., Ltd. (South Korea)
Hanku Cho, Samsung Electronics Co., Ltd. (South Korea)
Joo-Tae Moon, Samsung Electronics Co., Ltd. (South Korea)


Published in SPIE Proceedings Vol. 4691:
Optical Microlithography XV
Anthony Yen, Editor(s)

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