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Proceedings Paper

Extending KrF to 100-nm imaging with high-NA- and chromeless phase lithography technology
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Paper Details

Date Published: 30 July 2002
PDF: 13 pages
Proc. SPIE 4691, Optical Microlithography XV, (30 July 2002); doi: 10.1117/12.474594
Show Author Affiliations
Robert John Socha, ASML (United States)
Douglas J. Van Den Broeke, ASML MaskTools, Inc. (United States)
Linda Yu, ASML MaskTools, Inc. (United States)
Will Conley, Motorola (United States)
Wei Wu, Motorola (United States)
J. Fung Chen, ASML MaskTools, Inc. (United States)
John S. Petersen, Petersen Advanced Lithography, Inc. (United States)
David J. Gerold, Petersen Advanced Lithography, Inc. (United States)
Judith van Praagh, ASML (Netherlands)
Richard Droste, ASML (Netherlands)
Donis G. Flagello, ASML (United States)
Stephen Hsu, ASML MaskTools, Inc. (United States)

Published in SPIE Proceedings Vol. 4691:
Optical Microlithography XV
Anthony Yen, Editor(s)

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