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Proceedings Paper

Minimization of image placement errors in chromeless phase-shift mask lithography
Author(s): Michael Fritze; Brian Tyrrell; Susan G. Cann; Chris Carney; Betty Ann Blachowicz; David J. Brzozowy; Thomas Kocab; Scott Bowdoin; Peter D. Rhyins; Christopher J. Progler; Patrick M. Martin
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Paper Abstract

Image placement errors and their effect on process latitude are a remaining issue in the development of strong phase shift mask technology. In this work, we will review the various causes of image placement error for strong phase shift imaging, including both mask and stepper lens contributions. We will also review various methods of minimizing these image shift errors including the mask fabrication process, stepper lens improvement, and proper design of the lithography process. We will also present experimental results showing how aerial image asymmetry effects can be minimized by the use of an optimized resist process.

Paper Details

Date Published: 30 July 2002
PDF: 11 pages
Proc. SPIE 4691, Optical Microlithography XV, (30 July 2002); doi: 10.1117/12.474592
Show Author Affiliations
Michael Fritze, MIT Lincoln Lab. (United States)
Brian Tyrrell, MIT Lincoln Lab. (United States)
Susan G. Cann, MIT Lincoln Lab. (United States)
Chris Carney, Arch Chemicals, Inc. (United States)
Betty Ann Blachowicz, Arch Chemicals, Inc. (United States)
David J. Brzozowy, Arch Chemicals, Inc. (United States)
Thomas Kocab, Arch Chemicals, Inc. (United States)
Scott Bowdoin, Schlumberger Ltd. (United States)
Peter D. Rhyins, Photronics, Inc. (United States)
Christopher J. Progler, Photronics, Inc. (United States)
Patrick M. Martin, Photronics, Inc. (United States)


Published in SPIE Proceedings Vol. 4691:
Optical Microlithography XV
Anthony Yen, Editor(s)

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