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Proceedings Paper

Minimization of image placement errors in chromeless phase-shift mask lithography
Author(s): Michael Fritze; Brian Tyrrell; Susan G. Cann; Chris Carney; Betty Ann Blachowicz; David J. Brzozowy; Thomas Kocab; Scott Bowdoin; Peter D. Rhyins; Christopher J. Progler; Patrick M. Martin
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Paper Details

Date Published: 30 July 2002
PDF: 11 pages
Proc. SPIE 4691, Optical Microlithography XV, (30 July 2002); doi: 10.1117/12.474592
Show Author Affiliations
Michael Fritze, MIT Lincoln Lab. (United States)
Brian Tyrrell, MIT Lincoln Lab. (United States)
Susan G. Cann, MIT Lincoln Lab. (United States)
Chris Carney, Arch Chemicals, Inc. (United States)
Betty Ann Blachowicz, Arch Chemicals, Inc. (United States)
David J. Brzozowy, Arch Chemicals, Inc. (United States)
Thomas Kocab, Arch Chemicals, Inc. (United States)
Scott Bowdoin, Schlumberger Ltd. (United States)
Peter D. Rhyins, Photronics, Inc. (United States)
Christopher J. Progler, Photronics, Inc. (United States)
Patrick M. Martin, Photronics, Inc. (United States)


Published in SPIE Proceedings Vol. 4691:
Optical Microlithography XV
Anthony Yen, Editor(s)

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