Share Email Print
cover

Proceedings Paper

Subresolution assist feature implementation for high-performance logic gate-level lithography
Author(s): Allen H. Gabor; James A. Bruce; William Chu; Richard A. Ferguson; Carlos A. Fonseca; Ronald L. Gordon; Kenneth R. Jantzen; Mukesh Khare; Mark A. Lavin; Woo-Hyeong Lee; Lars W. Liebmann; Karl Paul Muller; Jed H. Rankin; Patrick Varekamp; Franz X. Zach
Format Member Price Non-Member Price
PDF $14.40 $18.00

Paper Details

Date Published: 30 July 2002
PDF: 8 pages
Proc. SPIE 4691, Optical Microlithography XV, (30 July 2002); doi: 10.1117/12.474591
Show Author Affiliations
Allen H. Gabor, IBM Microelectronics (United States)
James A. Bruce, IBM Microelectronics (United States)
William Chu, IBM Microelectronics (United States)
Richard A. Ferguson, IBM Microelectronics (United States)
Carlos A. Fonseca, IBM Microelectronics (United States)
Ronald L. Gordon, IBM Microelectronics (United States)
Kenneth R. Jantzen, IBM Microelectronics (United States)
Mukesh Khare, IBM Microelectronics (United States)
Mark A. Lavin, IBM Microelectronics (United States)
Woo-Hyeong Lee, IBM Microelectronics (United States)
Lars W. Liebmann, IBM Microelectronics (United States)
Karl Paul Muller, IBM Microelectronics (United States)
Jed H. Rankin, IBM Microelectronics (United States)
Patrick Varekamp, IBM Microelectronics (United States)
Franz X. Zach, IBM Microelectronics (United States)


Published in SPIE Proceedings Vol. 4691:
Optical Microlithography XV
Anthony Yen, Editor(s)

© SPIE. Terms of Use
Back to Top