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Proceedings Paper

Impact of Zernike cross-term on linewidth control
Author(s): Toshiharu Nakashima; Kenji Higashi; Shigeru Hirukawa
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Paper Abstract

Recent introduction of phase measurement interferometer (PMI), to measure wavefront aberrations brought about rapid reduction of residual aberrations in stepper and scanner projection lenses. Zernike sensitivity method (ZSM) is useful to capture and to understand the lens aberrations impact on the imaging performances, and to guide the improvements in patterning performance of the projection tools. In this paper we present ZSM for CD-Focus curve capable of precisely predicting CD at any focus position. We found that cross-term interactions of several Zernike combinations impact ZSM for CD-Focus. We present an example of V-H difference for which the cross-term interactions dominate. Aerial image simulation results presented here are illustrated by corresponding to experimental results.

Paper Details

Date Published: 30 July 2002
PDF: 11 pages
Proc. SPIE 4691, Optical Microlithography XV, (30 July 2002); doi: 10.1117/12.474590
Show Author Affiliations
Toshiharu Nakashima, Nikon Corp. (Japan)
Kenji Higashi, Nikon Corp. (Japan)
Shigeru Hirukawa, Nikon Corp. (Japan)

Published in SPIE Proceedings Vol. 4691:
Optical Microlithography XV
Anthony Yen, Editor(s)

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