Share Email Print
cover

Proceedings Paper

Production-ready 4-kHz ArF laser for 193-nm lithography
Author(s): Choonghoon Oh; Vladimir B. Fleurov; Thomas Hofmann; Thomas P. Duffey; F. Trintchouk; Patrick O'Keeffe; Peter C. Newman; Gerry M. Blumenstock
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

Semiconductor chip manufacturing is on the verge of a new production process node driving critical feature sizes below 100 nm. The next generation of 193 nm Argon Fluoride laser, the NanoLithTM 7000, has been developed in response to this recent technology development in the lithography industry. The NanoLithTM 7000, offering 20 Watts average output power at 4 kHz repetition rate, is designed to support the highest exposure tool scan speeds for maximum productivity and wafer throughput. Technology improvements to support the move from pilot production to full production will be described. With core technology defined and performance to specification established, attention turns to cost of operation, which is closely tied to module lifetime and reliability. Here we present results of the NanoLithTM 7000 system lifetest tracking all optical performance data over a 4.4 Billion shot. The system is operated in firing modes ranging from 1-4 kHz, and up to 75% duty cycle. Overall system performance measured to date both in the lab and in the field suggests that this laser meets all the production requirements for 193 nm lithography.

Paper Details

Date Published: 30 July 2002
PDF: 8 pages
Proc. SPIE 4691, Optical Microlithography XV, (30 July 2002); doi: 10.1117/12.474567
Show Author Affiliations
Choonghoon Oh, Cymer, Inc. (United States)
Vladimir B. Fleurov, Cymer, Inc. (United States)
Thomas Hofmann, Cymer, Inc. (United States)
Thomas P. Duffey, Cymer, Inc. (United States)
F. Trintchouk, Cymer, Inc. (United States)
Patrick O'Keeffe, Cymer, Inc. (United States)
Peter C. Newman, Cymer, Inc. (United States)
Gerry M. Blumenstock, Cymer, Inc. (United States)


Published in SPIE Proceedings Vol. 4691:
Optical Microlithography XV
Anthony Yen, Editor(s)

© SPIE. Terms of Use
Back to Top