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Proceedings Paper

Reduction of reflective notching through illumination optimization
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Paper Abstract

Photolithography on reflective surfaces with topography can cause exposure in unwanted areas, resulting in the phenomenon of reflective notching. Solutions to this problem are known within the industry, including the use of bottom anti-reflective coatings (ARCs) and dyed photoresist. In certain situations, such as on implant layers, the use of a BARC may be impractical. One potential solution to this problem lies in optimization of the illumination settings. It is known that changes in the illumination settings NA and sigma have an impact on the swing curve amplitude. It will be shown that for certain situations, reflective notching can be virtually eliminated through proper selection of the illumination settings.

Paper Details

Date Published: 30 July 2002
PDF: 9 pages
Proc. SPIE 4691, Optical Microlithography XV, (30 July 2002); doi: 10.1117/12.474566
Show Author Affiliations
James C. Word, Integrated Device Technology, Inc. (United States)
Dyiann Chou, Integrated Device Technology, Inc. (United States)
Yiming Gu, Integrated Device Technology, Inc. (United States)
John L. Sturtevant, Integrated Device Technology, Inc. (United States)


Published in SPIE Proceedings Vol. 4691:
Optical Microlithography XV
Anthony Yen, Editor(s)

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