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Proceedings Paper

Development of low-loss optical coatings for 157-nm lithography
Author(s): Ryuji Biro; Kazuho Sone; Shunsuke Niisaka; Minoru Otani; Yasuyuki Suzuki; Chidane Ouchi; Tadahiko Saito; Masanobu Hasegawa; Jun Saito; Akira Tanaka; Akira Matsumoto
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Paper Abstract

In the F2 laser lithography, it is essential to reduce the loss of the optical coatings deposited on calcium fluoride lenses. In order to make low loss optical coatings, we have developed measurement apparatus, evaluated the coatings with various analyses, and found a correlation with the optical constants. In this paper we describe the optical loss measurement apparatus and the evaluation results analyzed for either single layer coatings or multi-layer anti-reflection coatings.

Paper Details

Date Published: 30 July 2002
PDF: 10 pages
Proc. SPIE 4691, Optical Microlithography XV, (30 July 2002); doi: 10.1117/12.474550
Show Author Affiliations
Ryuji Biro, Association of Super-Advanced Electronics Technologies (Japan)
Canon Inc. (Japan)
Kazuho Sone, Association of Super-Advanced Electronics Technologies (Japan)
Canon Inc. (Japan)
Shunsuke Niisaka, Association of Super-Advanced Electronics Technologies (Japan)
Nikon Corp. (Japan)
Minoru Otani, Association of Super-Advanced Electronics Technologies (Japan)
Canon Inc. (Japan)
Yasuyuki Suzuki, Association of Super-Advanced Electronics Technologies (Japan)
Canon Inc. (Japan)
Chidane Ouchi, Association of Super-Advanced Electronics Technologies (Japan)
Canon Inc. (Japan)
Tadahiko Saito, Association of Super-Advanced Electronics Technologies (Japan)
Nikon Corp. (Japan)
Masanobu Hasegawa, Association of Super-Advanced Electronics Technologies (Japan)
Canon Inc. (Japan)
Jun Saito, Association of Super-Advanced Electronics Technologies (Japan)
Nikon Corp. (Japan)
Akira Tanaka, Association of Super-Advanced Electronics Technologies (Japan)
Nikon Corp. (Japan)
Akira Matsumoto, Association of Super-Advanced Electronics Technologies (Japan)
Nikon Corp. (Japan)


Published in SPIE Proceedings Vol. 4691:
Optical Microlithography XV
Anthony Yen, Editor(s)

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