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Proceedings Paper

Improvement of two-photon absorption lithography
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Paper Abstract

Recently, a novel Resolution Enhancement Technology (RET) have been proposed to overcome the Rayleigh resolution limit by using both entangled photon pair and two-photon absorption resist. However, the illumination intensity is not enough to attain the reasonable throughput. We propose a new method which enables to enhance the resolution over the Rayleigh limit with more strong intensity source by using two-photon absorption resist, where the absorbed two photons have different polarization each other. Since it is recently reported that the stimulated emission of polarization-entangled photons has been achieved, we investigate the effect of such entangled four photons to the resolution enhancement instead of entangled photon pair. Moreover, we also study the application of two-mode squeezing state.

Paper Details

Date Published: 30 July 2002
PDF: 8 pages
Proc. SPIE 4691, Optical Microlithography XV, (30 July 2002); doi: 10.1117/12.474547
Show Author Affiliations
Masato Shibuya, Tokyo Institute of Polytechnics (Japan)
Hiromi Ezaki, Tokyo Institute of Polytechnics (Japan)


Published in SPIE Proceedings Vol. 4691:
Optical Microlithography XV
Anthony Yen, Editor(s)

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