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Proceedings Paper

Modified Rayleigh equation: impact of image fluctuation on imaging performance
Author(s): Seiji Matsuura; Takeo Hashimoto
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Paper Abstract

The Rayleigh equation given by R equals k1 X (lambda) /NA is often used to predict the resolution (R) of optical lithography. Since the design rule is approaching half of wavelength, however, lithographic performance imperfectly follows the Rayleigh equation. In other words, the constant k1 does not represent the process difficulty expressed as contrast, exposure dose latitude, and mask error enhancement factor (MEEF). We propose a modified Rayleigh equation that considers the influence of image fluctuation on lithographic resolution, and confirmed that lithographic performance can be predicted more accurately by the modified equation than by the conventional equation. According to the modified equation, resolution will not be more enhanced than that predicted by the conventional Rayleigh equation, even if lens numerical aperture is increased.

Paper Details

Date Published: 30 July 2002
PDF: 9 pages
Proc. SPIE 4691, Optical Microlithography XV, (30 July 2002); doi: 10.1117/12.474527
Show Author Affiliations
Seiji Matsuura, NEC Corp. (Japan)
Takeo Hashimoto, NEC Corp. (Japan)


Published in SPIE Proceedings Vol. 4691:
Optical Microlithography XV
Anthony Yen, Editor(s)

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