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Proceedings Paper

Characterization of a projection lens using the extended Nijboer-Zernike approach
Author(s): Peter Dirksen; Joseph J. M. Braat; Peter De Bisschop; Guido C.A.M. Janssen; Casper A. H. Juffermans; Alvina M. Williams
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Paper Abstract

In this paper we give the proof of principle of a new experimental method to determine the aberrations of an optical system in the field. The measurement is based on the observation of the intensity point spread function of the lens. To analyze and interpret the measurement, use is made of an analytical method, the so-called extended Nijboer-Zernike approach. The new method is applicable to lithographic projection lenses, but also to EUV mirror systems or microscopes such as the objective lens of an optical mask inspection tool. Phase retrieval is demonstrated both analytically and experimentally. Theory and experimental results are given.

Paper Details

Date Published: 30 July 2002
PDF: 8 pages
Proc. SPIE 4691, Optical Microlithography XV, (30 July 2002); doi: 10.1117/12.474523
Show Author Affiliations
Peter Dirksen, Philips Research Labs. (Belgium)
Joseph J. M. Braat, Delft Univ. of Technology (Netherlands)
Peter De Bisschop, IMEC (Belgium)
Guido C.A.M. Janssen, Philips Research Labs. (Netherlands)
Casper A. H. Juffermans, Philips Research Labs. (Belgium)
Alvina M. Williams, International SEMATECH (United States)


Published in SPIE Proceedings Vol. 4691:
Optical Microlithography XV
Anthony Yen, Editor(s)

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