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Proceedings Paper

Mask damage by electrostatic discharge: a reticle printability evaluation
Author(s): Andrew Rudack; Lawrence Levit; Alvina M. Williams
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Paper Abstract

An evaluation of a Photolithography Mask damaged by Electrostatic Discharge (ESD) is presented, using pictures and data from the toolset at International SEMATECH's Advanced Technology Development Facility. The Photomask used in the printability evaluation is the Canary (DuPont TM) Reticle, demonstrating various degrees of ESD-induced damage to a repeating structure contained in the chrome-on-quartz pattern. Levels of damage to the chrome structures vary from non-existent, to barely detectable, to moderate, to catastrophic. The ESD-induced damage is then measured and compared through an assortment of Mask Metrology tools.

Paper Details

Date Published: 30 July 2002
PDF: 8 pages
Proc. SPIE 4691, Optical Microlithography XV, (30 July 2002); doi: 10.1117/12.474516
Show Author Affiliations
Andrew Rudack, International SEMATECH (United States)
Lawrence Levit, Ion Systems, Inc. (United States)
Alvina M. Williams, International SEMATECH (United States)


Published in SPIE Proceedings Vol. 4691:
Optical Microlithography XV
Anthony Yen, Editor(s)

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