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Proceedings Paper

Inspection of chromeless AAPSM
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Paper Abstract

The Chromeless Phase Shift Mask (CLM) approach from ASML MaskTools has been developed as an approach to achieve sub-100nm lithography using currently available stepper technology. The technology uses sub-resolution gray-scaled regions of zero-phase and pi-phase quartz on the mask to produce effective feature widths well below 100nm at the wafer. The features on the mask consist entirely of etched and unetched quartz. No features consist of chrome on the mask. The integration of this type of phase shift mask technology into the photomask-manufacturing environment requires that the mask manufacturer be able to inspect the mask for defects in the quartz. The Defect Sensitivity Monitor (DSM) pattern was used to construct a CLM mask. The mask was inspected using commercially available inspection platforms, and the resulting inspection capability is reported.

Paper Details

Date Published: 30 July 2002
PDF: 4 pages
Proc. SPIE 4691, Optical Microlithography XV, (30 July 2002); doi: 10.1117/12.474513
Show Author Affiliations
Darren Taylor, Photronics Inc. (United States)
Matthew Lassiter, Photronics Inc. (United States)
Benjamin George Eynon Jr., Photronics Inc. (United States)
Douglas J. Van Den Broeke, ASML MaskTools, Inc. (United States)
J. Fung Chen, ASML MaskTools, Inc. (United States)

Published in SPIE Proceedings Vol. 4691:
Optical Microlithography XV
Anthony Yen, Editor(s)

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