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Proceedings Paper

Hopkins versus Abbe: a lithography simulation matching study
Author(s): Ralph E. Schlief; Armin Liebchen; J. Fung Chen
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Paper Abstract

We have developed an ultrafast lithographic 2D aerial image simulator named LithoCruiserTM. It employs a novel algorithm based on Hopkins imaging (Titanium model). Compared to currently available simulation tools, LithoCruiser has demonstrated an order of magnitude increase in computational speed. This makes it well suited for predicting the printing of sizeable 2D patterns as well as the analysis of overlapping process windows for multiple feature cut-lines. With such a high computational speed, there is a need to determine whether its accuracy has been compromised. A comprehensive set of comparisons was performed against an internal standard based on Abbe imaging (Platinum model) - one that is comparable to commercially available simulators. Analyses of CD through pitch for three 1D mask types (binary chrome, dark field, and PSM) as a function of NA, illumination, and aberrations were conducted. LithoCruiser predicted trends through pitch that agreed well with both internal standard and commercially available lithography simulators. Largest deviations were no more than 5 to 10 nm with typical values of 3 to 5 nm. As the LithoCruiser accuracy setting was increased, CD values converged to target values. The accuracy of CD values was essentially independent of simulation grid setting when less than or equal to 10 nm.

Paper Details

Date Published: 30 July 2002
PDF: 12 pages
Proc. SPIE 4691, Optical Microlithography XV, (30 July 2002); doi: 10.1117/12.474491
Show Author Affiliations
Ralph E. Schlief, ASML MaskTools, Inc. (United States)
Armin Liebchen, ASML MaskTools, Inc. (United States)
J. Fung Chen, ASML MaskTools, Inc. (United States)

Published in SPIE Proceedings Vol. 4691:
Optical Microlithography XV
Anthony Yen, Editor(s)

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