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Proceedings Paper

Algorithmic implementations of domain decomposition methods for the diffraction simulation of advanced photomasks
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Paper Abstract

The domain decomposition method developed in [1] is examined in more detail. This method enables rapid computer simulation of advanced photomask (alt. PSM, masks with OPC) scattering and transmission properties. Compared to 3D computer simulation, speed-up factors of approximately 400, and up to approximately 200,000 when using the look-up table approach, are possible. Combined with the spatial frequency properties of projection printing systems, it facilitates accurate computer simulation of the projected image (normalized mean square error of a typical image is only a fraction of 1%). Some esoteric accuracy issues of the method are addressed and the way to handle arbitrary, Manhattan-type mask layouts is presented. The method is shown to be valid for off-axis incidence. The cross-talk model developed in [1] is used in 3D mask simulations (2D layouts).

Paper Details

Date Published: 30 July 2002
PDF: 18 pages
Proc. SPIE 4691, Optical Microlithography XV, (30 July 2002); doi: 10.1117/12.474483
Show Author Affiliations
Konstantinos Adam, Univ. of California/Berkeley (United States)
Andrew R. Neureuther, Univ. of California/Berkeley (United States)

Published in SPIE Proceedings Vol. 4691:
Optical Microlithography XV
Anthony Yen, Editor(s)

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