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Proceedings Paper

Intensity ratio alignment technique in photoelastic modulation ellipsometry and polarimetry
Author(s): Yu-Faye Chao
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Paper Abstract

The concept of intensity ratio alignment technique will be introduced by comparing it with the conventional null technique. For in situ/real time monitoring the plasma etching process, we will introduce a fixed incident angle alignment technique for a photoelastic modulation ellipsometer. In addition to ellipsometry, we will introduce a photoelastic modulation polarimetry to measure the twisted angle and phase retardation of a twisted nematic liquid.

Paper Details

Date Published: 17 February 2003
PDF: 8 pages
Proc. SPIE 4833, Applications of Photonic Technology 5, (17 February 2003); doi: 10.1117/12.474392
Show Author Affiliations
Yu-Faye Chao, National Chiao Tung Univ. (Taiwan)

Published in SPIE Proceedings Vol. 4833:
Applications of Photonic Technology 5
Roger A. Lessard; George A. Lampropoulos; Gregory W. Schinn, Editor(s)

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