Share Email Print
cover

Proceedings Paper

Intensity ratio alignment technique in photoelastic modulation ellipsometry and polarimetry
Author(s): Yu-Faye Chao
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

The concept of intensity ratio alignment technique will be introduced by comparing it with the conventional null technique. For in situ/real time monitoring the plasma etching process, we will introduce a fixed incident angle alignment technique for a photoelastic modulation ellipsometer. In addition to ellipsometry, we will introduce a photoelastic modulation polarimetry to measure the twisted angle and phase retardation of a twisted nematic liquid.

Paper Details

Date Published: 17 February 2003
PDF: 8 pages
Proc. SPIE 4833, Applications of Photonic Technology 5, (17 February 2003); doi: 10.1117/12.474392
Show Author Affiliations
Yu-Faye Chao, National Chiao Tung Univ. (Taiwan)


Published in SPIE Proceedings Vol. 4833:
Applications of Photonic Technology 5
Roger A. Lessard; George A. Lampropoulos; Gregory W. Schinn, Editor(s)

© SPIE. Terms of Use
Back to Top