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Proceedings Paper

Scale-reduction rule for diaphragm dimensions to miniaturize a silicon-based integrated optic pressure sensor without reducing sensitivity
Author(s): Atsushi Yamada; Toru Tokita; Masashi Ohkawa; Seishi Sekine; Takashi Sato
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Paper Abstract

In this paper, an original scale-reduction rule without sensitivity loss in integrated optic pressure sensors based on the elasto-optic effect is described. The sensor has a rectangular diaphragm as a pressure-sensitive mechanical structure and a sensing waveguide on the diaphragm. In this type of sensor, sensitivity is theoretically known to be strongly dependent on the dimensions of the diaphragm. According to the theoretical results, the sensitivity can be kept constant even if the diaphragm dimensions are reduced as long as both the side length ratio and the characteristic length remain constant. Here, the characteristic length is introduced as the sube of the shorter side length of the diaphragm divided by the square of the thickness. Such a scale-reduction rule would be very significant in the miniaturizing of a sensor without reducing sensitivity, but it has not been experimentally confirmed. In this study, the scale-reduction rule was experimentally examined using three fabricated sensors, which had the same side length ratio and the same characteristic length. The exact dimensions of the sensors were 2.0 mm x 10mmx35 μm, 2.5 mmx12.5 mmx49 μm and 3.0 mmx15 mmx64 μm. The measured sensitivities of the three sensors were quite similar to each other as theoretically predicted.

Paper Details

Date Published: 19 June 2003
PDF: 8 pages
Proc. SPIE 4987, Integrated Optics: Devices, Materials, and Technologies VII, (19 June 2003); doi: 10.1117/12.474347
Show Author Affiliations
Atsushi Yamada, Niigata Univ. (Japan)
Toru Tokita, Niigata Univ. (Japan)
Masashi Ohkawa, Niigata Univ. (Japan)
Seishi Sekine, Niigata Univ. (Japan)
Takashi Sato, Niigata Univ. (Japan)

Published in SPIE Proceedings Vol. 4987:
Integrated Optics: Devices, Materials, and Technologies VII
Yakov S. Sidorin; Ari Tervonen, Editor(s)

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