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Proceedings Paper

Novel molecular resists based on inclusion complex of cyclodextrin
Author(s): Jin-Baek Kim; Young-Gil Kwon; Hyo-Jin Yun; Jae-Hak Choi
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Paper Abstract

A positive working molecular photoresist based on (beta) -cyclodextrin ((beta) -CD) and its inclusion complex ((beta) -CD-IC) has been developed. Cyclodextrin is one of the most important host molecules in supramolecular systems. 1-Adamantanecarboxylic acid (Ad-COOH) is employed as a guest molecule to increase the dry etch resistance. (beta) -CD and (beta) -CD-IC were protected with t-BOC to control the dissolution rate with various feed ratios of di-t-butyl dicarbonate. The t-BOC protecting ratio turns out about 34 mol% which corresponds to the protection of primary hydroxyl groups on the upper rim of (beta) -CD. The t-BOC-protected (beta) -CD has low absorbances at 248 and 193 nm, and good film forming property. Using t-BOC-protected (beta) -CD and (beta) -CD-IC, submicron patterns were delineated when it was exposed to a KrF stepper and developed with a 2.38 wt% aqueous TMAH solution.

Paper Details

Date Published: 24 July 2002
PDF: 9 pages
Proc. SPIE 4690, Advances in Resist Technology and Processing XIX, (24 July 2002); doi: 10.1117/12.474286
Show Author Affiliations
Jin-Baek Kim, Korea Advanced Institute of Science and Technology (South Korea)
Young-Gil Kwon, Korea Advanced Institute of Science and Technology (South Korea)
Hyo-Jin Yun, Korea Advanced Institute of Science and Technology (South Korea)
Jae-Hak Choi, Korea Advanced Institute of Science and Technology (South Korea)


Published in SPIE Proceedings Vol. 4690:
Advances in Resist Technology and Processing XIX
Theodore H. Fedynyshyn, Editor(s)

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