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Proceedings Paper

Improvement of line edge roughness by employing new PAG
Author(s): Yang-Sook Kim; Yun-Hyi Kim; Sang-Hyang Lee; Yun-Gill Yim; Deog-Bae Kim; Jae-Hyun Kim
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Paper Abstract

Novel organic PAGs have been prepared in order to improve line edge roughness (LER) of 248nm and 193nm resists. From careful design of PAG, transparent, highly diffusive PAG was successfully prepared. New PAGs have increased hydrophilicity in cationic portion of PAG(photoacid generator.).

Paper Details

Date Published: 24 July 2002
PDF: 8 pages
Proc. SPIE 4690, Advances in Resist Technology and Processing XIX, (24 July 2002); doi: 10.1117/12.474285
Show Author Affiliations
Yang-Sook Kim, DongJin Semichem Co., Ltd. (South Korea)
Yun-Hyi Kim, DongJin Semichem Co., Ltd. (South Korea)
Sang-Hyang Lee, DongJin Semichem Co., Ltd. (South Korea)
Yun-Gill Yim, DongJin Semichem Co., Ltd. (South Korea)
Deog-Bae Kim, DongJin Semichem Co., Ltd. (South Korea)
Jae-Hyun Kim, DongJin Semichem Co., Ltd. (South Korea)


Published in SPIE Proceedings Vol. 4690:
Advances in Resist Technology and Processing XIX
Theodore H. Fedynyshyn, Editor(s)

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