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Proceedings Paper

Novel photoacid generators for chemically amplified resists
Author(s): Hitoshi Yamato; Toshikage Asakura; Akira Matsumoto; Masaki Ohwa
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Paper Abstract

Recently we have developed new class of non-ionic oxime sulfonate PAG. The compounds generate various kinds of sulfonic acids, such as n-propane, n-octane, camphor and p-toluene sulfonic acid under Deep-UV exposure and are applicable for chemically amplified (CA) photoresists. The application-relevant properties of the compounds such as solubility in propylene glycol monomethyl ether acetate (PGMEA), ethyl lactate, ethyl 3-ethoxypropionate, and 2-heptanone, UV absorption, thermal stability with or without poly(4-hydroxystyrene) (PHS), storage stability in a neat form or in PGMEA solution with or without additives, sensitivity in a model resist formulation, dissolution inhibition efficiency during the development process and volatility were evaluated. The compounds exhibit good solubility in PGMEA, high sensitivity in positive tone CA resist formulations, with Deep-UV exposure, and no significant volatility. Especially it was found that the compounds are superior in terms of thermal stability and storage stability, i.e., high thermal stability up to 188 degree(s)C in a phenolic matrix, and no change during storage in PGMEA at 60 degree(s)C for 5 months.

Paper Details

Date Published: 24 July 2002
PDF: 10 pages
Proc. SPIE 4690, Advances in Resist Technology and Processing XIX, (24 July 2002); doi: 10.1117/12.474281
Show Author Affiliations
Hitoshi Yamato, Ciba Specialty Chemicals K.K. (Japan)
Toshikage Asakura, Ciba Specialty Chemicals K.K. (Japan)
Akira Matsumoto, Ciba Specialty Chemicals K.K. (Japan)
Masaki Ohwa, Ciba Specialty Chemicals K.K. (Japan)


Published in SPIE Proceedings Vol. 4690:
Advances in Resist Technology and Processing XIX
Theodore H. Fedynyshyn, Editor(s)

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