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Proceedings Paper

Novel development method for CD control: optimized spin-off development method
Author(s): Kazuo Sakamoto; Akira Nishiya; Kentarou Yamamura; Takahisa Otsuka
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Paper Abstract

A loading effect in particular is accounting for an increasing percentage of factors responsible for CD variations. A multi-puddle method in development process therefore is considered a solution of this problem. However, the method consumes large amounts of developer solution. In this paper, we have studied the influence of loading effect on CD and evaluated several development methods to minimize the influence. In this paper, we evaluated the correlation between the width of exposed area and CD in the device area. Based on this result, we estimated the diffusion range of dissolution products. We also found another phenomenon that CD uniformity within a wafer became worse when each pattern was surrounded by an unexposed area. A novel development method we have evaluated in this study is as follows: (1) perform a puddle formation normally; (2) after a short static development, spin off developer solution from the puddle; and (3) after the puddle is decreased in volume, perform a rather long static development. This new method proved to have the capability of minimizing the influence of dissolution products.

Paper Details

Date Published: 24 July 2002
PDF: 11 pages
Proc. SPIE 4690, Advances in Resist Technology and Processing XIX, (24 July 2002); doi: 10.1117/12.474279
Show Author Affiliations
Kazuo Sakamoto, Tokyo Electron Kyushu, Ltd. (Japan)
Akira Nishiya, Tokyo Electron Kyushu, Ltd. (Japan)
Kentarou Yamamura, Tokyo Electron Kyushu, Ltd. (Japan)
Takahisa Otsuka, Tokyo Electron Kyushu, Ltd. (Japan)

Published in SPIE Proceedings Vol. 4690:
Advances in Resist Technology and Processing XIX
Theodore H. Fedynyshyn, Editor(s)

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