Share Email Print
cover

Proceedings Paper

Advances in resists for 157-nm microlithography
Author(s): Brian C. Trinque; Brian Philip Osborn; Charles R. Chambers; Yu-Tsai Hsieh; Schuyler Boon Corry; Takashi Chiba; Raymond Jui-Pu Hung; Hoang Vi Tran; Paul Zimmerman; Daniel Miller; Will Conley; C. Grant Willson
Format Member Price Non-Member Price
PDF $14.40 $18.00

Paper Abstract

The synthesis and characterization of several new fluoropolymers designed for use in the formulation of photoresists for exposure at 157 nm will be described. The design of these resist platforms is based on learning from previously reported fluorine-containing materials. We have continued to explore anionic polymerizations, free radical polymerizations, metal-catalyzed addition polymerizations and metal-catalyzed copolymerizations with carbon monoxide in theses studies. The monomers were characterized by vacuum-UV (VUV) spectrometry and polymers characterized by variable angle spectroscopic ellipsometry (VASE). Resist formulations based on these polymers were exposed at the 157 nm wavelength to produce high-resolution images. The synthesis and structures of these new materials and the details of their processing will be presented.

Paper Details

Date Published: 24 July 2002
PDF: 11 pages
Proc. SPIE 4690, Advances in Resist Technology and Processing XIX, (24 July 2002); doi: 10.1117/12.474272
Show Author Affiliations
Brian C. Trinque, Univ. of Texas at Austin (United States)
Brian Philip Osborn, Univ. of Texas at Austin (United States)
Charles R. Chambers, Univ. of Texas at Austin (United States)
Yu-Tsai Hsieh, Univ. of Texas at Austin (United States)
Schuyler Boon Corry, Univ. of Texas at Austin (United States)
Takashi Chiba, Univ. of Texas at Austin (United States)
Raymond Jui-Pu Hung, Univ. of Texas at Austin (United States)
Hoang Vi Tran, Univ. of Texas at Austin (United States)
Paul Zimmerman, International SEMATECH (United States)
Daniel Miller, International SEMATECH (United States)
Will Conley, International SEMATECH (United States)
C. Grant Willson, Univ. of Texas/Austin (United States)


Published in SPIE Proceedings Vol. 4690:
Advances in Resist Technology and Processing XIX
Theodore H. Fedynyshyn, Editor(s)

© SPIE. Terms of Use
Back to Top