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Proceedings Paper

Newly developed acrylic copolymers for ArF photoresist
Author(s): Yoshihiro Kamon; Hikaru Momose; Hideaki Kuwano; Tadayuki Fujiwara; Masaharu Fujimoto
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Paper Abstract

We have developed novel acrylic copolymers for ArF photoresist which have more etching durability than usual. The excellent one of those copolymers in handling contains 8- or 9- methacryloyloxy-4-oxatricyclo[5.2.1.02,6]decan-3-one (OTDMA) and (gamma) ,(gamma) -dimethyl-(alpha) -methylene-(gamma) -butyrolac tone (DMMB). OTDMA is a new methacrylic ester monomer having a lactone unit with bridged structure. DMMB introduces a lactone structure to the main chain of acrylic copolymers. It was suggested that the solubility of monomers depends on the hindrance of their polar group, and the role of the hydrophilic monomers has been discussed from the standpoint of the position of their hydrophilic parts.

Paper Details

Date Published: 24 July 2002
PDF: 8 pages
Proc. SPIE 4690, Advances in Resist Technology and Processing XIX, (24 July 2002); doi: 10.1117/12.474263
Show Author Affiliations
Yoshihiro Kamon, Mitsubishi Rayon Co., Ltd. (Japan)
Hikaru Momose, Mitsubishi Rayon Co., Ltd. (Japan)
Hideaki Kuwano, Mitsubishi Rayon Co., Ltd. (Japan)
Tadayuki Fujiwara, Mitsubishi Rayon Co., Ltd. (Japan)
Masaharu Fujimoto, Mitsubishi Rayon Co., Ltd. (Japan)


Published in SPIE Proceedings Vol. 4690:
Advances in Resist Technology and Processing XIX
Theodore H. Fedynyshyn, Editor(s)

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