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Proceedings Paper

Novel fluoro copolymers for 157-nm photoresists: a progress report
Author(s): Christoph Hohle; Stefan Hien; Christian Eschbaumer; Joerg Rottstegge; Michael Sebald
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Paper Abstract

Several fluoro-substituted polymers consisting of acid cleavable methacryoic or cinnamic acid tert.-butyl ester compounds copolymerized with maleic acid anhydride derivatives were synthesized by radical copolymerization. Vacuum ultraviolet transmission measurements of the samples reveal absorbances down to 5micrometers -1 despite of the strongly absorbing anhydride moiety which serves as silylation anchor for the application of the Chemical Amplification of Resist Lines (CARL) process, one of the promising approaches for sub-90nm pattern fabrication. Some of the samples exhibit resolutions down to 110nm dense at 157nm exposure using an alternating phase shift mask. The feasibility of the CARL principle including the silylation reaction after development has been demonstrated with selected fluorinated polymer samples.

Paper Details

Date Published: 24 July 2002
PDF: 10 pages
Proc. SPIE 4690, Advances in Resist Technology and Processing XIX, (24 July 2002); doi: 10.1117/12.474252
Show Author Affiliations
Christoph Hohle, Infineon Technologies AG (Germany)
Stefan Hien, Infineon Technologies AG and International SEMATECH (United States)
Christian Eschbaumer, Infineon Technologies AG (Germany)
Joerg Rottstegge, Infineon Technologies AG (Germany)
Michael Sebald, Infineon Technologies AG (Germany)


Published in SPIE Proceedings Vol. 4690:
Advances in Resist Technology and Processing XIX
Theodore H. Fedynyshyn, Editor(s)

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