Share Email Print
cover

Proceedings Paper

Dry-etch resistance of fluorine functionalized polymers
Author(s): Meiten Koh; Takuji Ishikawa; Takayuki Araki; Hirokazu Aoyama; Tsuneo Yamashita; Tamio Yamazaki; Hiroyuki Watanabe; Minoru Toriumi; Toshiro Itani
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

The reactive ion etch (RIE) properties of fluorine funtionalized polymers in which fluorine atoms were incorporated in the main chain were examined. There was a tendency that the etching rates of these polymers were higher as lower the fluorine contents. The existing four models such as the Ohnishi model, the Kunz model, the Ohfuji model and the Kishimura model were applied to explain the correlation between the etching rates and the polymer compositions or structures, but the errors were too large to explain the relationship. A new model has developed to explain the effect of the fluorine incorporation to the dry etch resistance. The model assumed that there would be a correlation between the number of main chain fluorine atoms and the dry etch resistance, and the main chain fluorine incorporation would increase the dry etch resistance. The model could explain the dry etch resistance of the main chain fluorine incorporated polymers with adequate accuracy.

Paper Details

Date Published: 24 July 2002
PDF: 11 pages
Proc. SPIE 4690, Advances in Resist Technology and Processing XIX, (24 July 2002); doi: 10.1117/12.474246
Show Author Affiliations
Meiten Koh, Daikin Industries Co., Ltd. (Japan)
Takuji Ishikawa, Daikin Industries Co., Ltd. (Japan)
Takayuki Araki, Daikin Industries Co., Ltd. (Japan)
Hirokazu Aoyama, Daikin Industries Co., Ltd. (Japan)
Tsuneo Yamashita, Daikin Industries Co., Ltd. (Japan)
Tamio Yamazaki, Semiconductor Leading Edge Technologies, Inc. (Japan)
Hiroyuki Watanabe, Semiconductor Leading Edge Technologies, Inc. (Japan)
Minoru Toriumi, Semiconductor Leading Edge Technologies, Inc. (Japan)
Toshiro Itani, Semiconductor Leading Edge Technologies, Inc. (Japan)


Published in SPIE Proceedings Vol. 4690:
Advances in Resist Technology and Processing XIX
Theodore H. Fedynyshyn, Editor(s)

© SPIE. Terms of Use
Back to Top