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Proceedings Paper

Chain conformation in ultrathin polymer films
Author(s): Ronald L. Jones; Christopher L. Soles; Francis W. Starr; Eric K. Lin; Joseph L. Lenhart; Wen-li Wu; Dario L. Goldfarb; Marie Angelopoulos
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Paper Abstract

Using Small Angle Neutron Scattering (SANS), we present the first quantitative measurements of the 3-dimensional conformation of macromolecules in thin polymer films of D < RG,Bulk, where D is the film thickness and RG,Bulk is the bulk radius of gyration. For D approximately equals 0.5 RG,Bulk, the molecular size along the film normal is less than 0.5 RG,Bulk, while relatively small changes are observed parallel to the surface. The observed changes in molecular size agree with predictions of molecular dynamics simulations of polymers confined in thin films, resulting from increased molecular orientation rather than chain distortion. Segregation of molecular centers of mass to the film center facilitates molecular packing while minimizing chain distortion. Estimates of length scales relating to the onset of chain distortion and chain orientation in thin film resists are D approximately equals 0.1 RG,Bulk and D approximately equals N(sigma ) respectively, where D is the film thickness, N is the number of chain segments, and (sigma) is the persistence length.

Paper Details

Date Published: 24 July 2002
PDF: 9 pages
Proc. SPIE 4690, Advances in Resist Technology and Processing XIX, (24 July 2002); doi: 10.1117/12.474232
Show Author Affiliations
Ronald L. Jones, National Institute of Standards and Technology (United States)
Christopher L. Soles, National Institute of Standards and Technology (United States)
Francis W. Starr, National Institute of Standards and Technology (United States)
Eric K. Lin, National Institute of Standards and Technology (United States)
Joseph L. Lenhart, National Institute of Standards and Technology (United States)
Wen-li Wu, National Institute of Standards and Technology (United States)
Dario L. Goldfarb, IBM Thomas J. Watson Research Ctr. (United States)
Marie Angelopoulos, IBM Thomas J. Watson Research Ctr. (United States)


Published in SPIE Proceedings Vol. 4690:
Advances in Resist Technology and Processing XIX
Theodore H. Fedynyshyn, Editor(s)

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