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Proceedings Paper

Characterization and acid diffusion measurements of new strong acid photoacid generators
Author(s): Gregory M. Wallraff; Carl E. Larson; Nicolette Fender; Blake Davis; David R. Medeiros; Jeff Meute; William M. Lamanna; Mike J. Parent; T. Robeledo; Gregory L. Young
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Paper Abstract

As resist feature sizes have decreased and the performance demands on chemically amplified photoresists have increased the role of the photoacid generator (PAG) in determining overall resist performance has become increasingly apparent. Over the past 20 years a variety of different types of PAG's have been introduced as researchers have sought to optimize properties such as acid strength, acid volatility, diffusion length, wavelength response, solubility etc. PAGs that produce very strong organic acids are widely used, in part because of requirements for high photospeed resists. Most of these acid generators are based on perfluoroalkyl sulfonic acid based onium salts. In an effort to identify and characterize alternative PAGs we have investigated the performance of a variety of photoacid generators that are not based on sulfonic acids. In this report we will describe the relative reactivities of these PAGs under a variety of exposure wavelengths and processing conditions including acid diffusion proprieties and photospeed measurements.

Paper Details

Date Published: 24 July 2002
PDF: 9 pages
Proc. SPIE 4690, Advances in Resist Technology and Processing XIX, (24 July 2002); doi: 10.1117/12.474215
Show Author Affiliations
Gregory M. Wallraff, IBM Almaden Research Ctr. (United States)
Carl E. Larson, IBM Almaden Research Ctr. (United States)
Nicolette Fender, IBM Almaden Research Ctr. (United States)
Blake Davis, IBM Almaden Research Ctr. (United States)
David R. Medeiros, IBM Almaden Research Ctr. (United States)
Jeff Meute, IBM Almaden Research Ctr. (United States)
William M. Lamanna, 3M Co. (United States)
Mike J. Parent, 3M Co. (United States)
T. Robeledo, San Jose State Univ. (United States)
Gregory L. Young, San Jose State Univ. (United States)


Published in SPIE Proceedings Vol. 4690:
Advances in Resist Technology and Processing XIX
Theodore H. Fedynyshyn, Editor(s)

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