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Proceedings Paper

Macrocycle monomer having ethyleneoxy unit to buffer acid diffusion (new base for photoresist)
Author(s): Geunsu Lee; Keun-Kyu Kong; Jae Chang Jung; Ki-Soo Shin; Jae-Hyun Kang; Sang-Don Kim; Yong-Jun Choi; Se-Jin Choi; Deog-Bae Kim; Jae-Hyun Kim
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Paper Abstract

Crown ether derivatives are composed of multi-ethyleneoxy units and have an electron rich cavity that can accommodate a proton. We have broadly investigated the effect of lone pair electrons of accumulated oxygen. First, we studied whether these crown compounds can control acid diffusion or not. Second, we synthesized monomers containing cyclic multi-ethyleneoxy units and studied their effect in polymers. Finally, we compared them with amines. Crown either, 18-crown-6, has a proper cavity to capture a proton by hydrogen bonding and actually had enough basicity to control acid diffusion. These studies show that crown ether derivatives can replace amines as a bases to restrain acid diffusion.

Paper Details

Date Published: 24 July 2002
PDF: 5 pages
Proc. SPIE 4690, Advances in Resist Technology and Processing XIX, (24 July 2002); doi: 10.1117/12.474211
Show Author Affiliations
Geunsu Lee, Hyundai Electronics Industries Co., Ltd. (South Korea)
Keun-Kyu Kong, Hyundai Electronics Industries Co., Ltd. (South Korea)
Jae Chang Jung, Hyundai Electronics Industries Co., Ltd. (South Korea)
Ki-Soo Shin, Hyundai Electronics Industries Co., Ltd. (South Korea)
Jae-Hyun Kang, DongJin Semichem Co., Ltd. (South Korea)
Sang-Don Kim, DongJin Semichem Co., Ltd. (South Korea)
Yong-Jun Choi, DongJin Semichem Co., Ltd. (South Korea)
Se-Jin Choi, DongJin Semichem Co., Ltd. (South Korea)
Deog-Bae Kim, DongJin Semichem Co., Ltd. (South Korea)
Jae-Hyun Kim, DongJin Semichem Co., Ltd. (South Korea)


Published in SPIE Proceedings Vol. 4690:
Advances in Resist Technology and Processing XIX
Theodore H. Fedynyshyn, Editor(s)

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