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Proceedings Paper

New approach for 193-nm resist using modified cycloolefin resin
Author(s): Joo Hyeon Park; Dong-Chul Seo; Chang-Min Kim; Young Tak Lim; Seong Duk Jo; Jong-Bum Lee; Hyeon Sang Joo; Hyun Pyo Jeon; Seong-Ju Kim; Jae Chang Jung; Ki-Soo Shin; Keun-Kyu Kong; Tatsuya Yamada
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Paper Abstract

We have investigated new photoresist materials based on modified cycloolefin-maleic anhydride resin for 193nm lithography. Compared to COMA resin, the new resin offers several good properties such as UV transmittance, taper in pattern profile, PED stability and storage stability. The resist using the new resin showed good lithographic performances on ArF exposure tool. So, we obtained good hole patterns below 90nm with condition of exposure: PAS 5500/900 full field scanner, resist thickness: 320nm, development: 2.38% TMAH, for 40sec., Illumination: 0.61NA, conventional SOB: 110 degree(s)C/90sec, PEB:130 degree(s)C/90sec, on BARC. In this paper we will report on the properties of new polymer and will show the contact hole pattern that demonstrate progress in these areas.

Paper Details

Date Published: 24 July 2002
PDF: 7 pages
Proc. SPIE 4690, Advances in Resist Technology and Processing XIX, (24 July 2002); doi: 10.1117/12.474209
Show Author Affiliations
Joo Hyeon Park, Kumho Petrochemical Co., Ltd. (South Korea)
Dong-Chul Seo, Kumho Petrochemical Co., Ltd. (South Korea)
Chang-Min Kim, Kumho Petrochemical Co., Ltd. (South Korea)
Young Tak Lim, Kumho Petrochemical Co., Ltd. (South Korea)
Seong Duk Jo, Kumho Petrochemical Co., Ltd. (South Korea)
Jong-Bum Lee, Kumho Petrochemical Co., Ltd. (South Korea)
Hyeon Sang Joo, Kumho Petrochemical Co., Ltd. (South Korea)
Hyun Pyo Jeon, Kumho Petrochemical Co., Ltd. (South Korea)
Seong-Ju Kim, Kumho Petrochemical Co., Ltd. (South Korea)
Jae Chang Jung, Hynix Semiconductor, Inc. (South Korea)
Ki-Soo Shin, Hynix Semiconductor, Inc. (South Korea)
Keun-Kyu Kong, Hynix Semiconductor, Inc. (South Korea)
Tatsuya Yamada, Nagase ChemteX Corp. (Japan)


Published in SPIE Proceedings Vol. 4690:
Advances in Resist Technology and Processing XIX
Theodore H. Fedynyshyn, Editor(s)

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