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Proceedings Paper

Single molecular lithography using polystyrene (MW:2000)
Author(s): M. Suzuki; Shinzo Morita
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Paper Abstract

We analyzed nano-lithography process with using plasma graft polymerized styrene resist and spin coated polystyrene resist in order to find problems and limit of downsizing of the lithography pattern. The ESCA measurement of the interface between the resist and the substrate revealed the chemical structure. Plasma grafted styrene had a chemical bond to the silicon substrate. But spin coated polystyrene was observed that the film condensed without the chemical bond to the substrate. For the spin coated polystyrene film at a thickness of 1nm, ESCA measurement showed a simple peak of carbon and silicon, but showed new chemical shift after Ar ion or E-beam treatment. These results suggested that utilization of the chemical bond between polystyrene and Si will realize single molecular lithography. In this work, we also discussed the mechanism of pattern resolution comparing polystyrene at 2000 and 800 of a molecular weight.

Paper Details

Date Published: 24 July 2002
PDF: 5 pages
Proc. SPIE 4690, Advances in Resist Technology and Processing XIX, (24 July 2002); doi: 10.1117/12.474208
Show Author Affiliations
M. Suzuki, Nagoya Univ. (Japan)
Shinzo Morita, Nagoya Univ. (Japan)


Published in SPIE Proceedings Vol. 4690:
Advances in Resist Technology and Processing XIX
Theodore H. Fedynyshyn, Editor(s)

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