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Proceedings Paper

Novel alicyclic polymers having 7,7-dimethyloxepan-2-one acid labile groups for ArF lithography
Author(s): Jae-Jun Lee; Jin-Baek Kim; Kenji Honda
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Paper Abstract

The present paper describes a novel class of norbornene- based copolymers containing 7,7-dimethyloxepan-2-one acid labile groups. Poly(3-(bicyclo[2.2.1]hept-5-en-2- ylhydroxymethyl)-7,7-dimethyloxepan-2-one-co-5-((2- decahydronaphth-yl)oxycarbonyl)-norbornene-co-5-norbornene- 2-carboxxylic acid-co-maleic anhydride) was synthesized and evaluated as a potential chemically amplified resist for ArF lithography. The 7,7-dimethyloxepan-2-one group of the matrix polymer was readily cleaved and the carboxylic acid functionality was formed by acid-catalyzed ring-opening reaction in the exposed region after post-exposure bake. 0.12micrometers line and space patterns were obtained at a dose of 10 mJ cm-2 with a conventional developer, 2.38 wt% tetramethylammonium hydroxide aqueous solution, using an ArF excimer laser stepper.

Paper Details

Date Published: 24 July 2002
PDF: 10 pages
Proc. SPIE 4690, Advances in Resist Technology and Processing XIX, (24 July 2002); doi: 10.1117/12.474206
Show Author Affiliations
Jae-Jun Lee, Korea Advanced Institute of Science and Technology and Samsung Advanced Institute of Techn (South Korea)
Jin-Baek Kim, Korea Advanced Institute of Science and Technology (South Korea)
Kenji Honda, Samsung Advanced Institute of Technology (South Korea)


Published in SPIE Proceedings Vol. 4690:
Advances in Resist Technology and Processing XIX
Theodore H. Fedynyshyn, Editor(s)

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