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Proceedings Paper

Novel approach for high resolution using cycloolefin-alt-maleic acid derivatives polymer for ArF lithography
Author(s): Jong-Bum Lee; Joo Hyeon Park; Dong-Chul Seo; Chang-Min Kim; Young Tak Lim; Seung-duk Cho; Hyun-Sang Joo; Hyun Pyo Jeon; Seong-Ju Kim
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Paper Abstract

Polyacrylate derivative was first developed as raw material for ArF resist and it was selected the first candidate in spite of some defects. Cycloolefin-maleic anhydride polymer[COMA] and other polymers were therefore given opportunity. The resist based on COMA shows a good dry-etch resistance compared with that based on acrylate polymer. However, the pattern profile of the resist formulated by using COMA has some defects such as taper and low resolution because of transmittance issue of the polymer. In order to solve the issue, we have developed a new polymer [It was named ROMA Resin]. The new polymer has good physical properties such as UV transmittance, stability during storage and moderate glass transition temperature. We also found that the pattern profile of the resist formulated by using the polymer shows good results in terms of pattern profile, CD SEM slimming and PED stability.

Paper Details

Date Published: 24 July 2002
PDF: 8 pages
Proc. SPIE 4690, Advances in Resist Technology and Processing XIX, (24 July 2002); doi: 10.1117/12.474202
Show Author Affiliations
Jong-Bum Lee, Korea Kumho Petrochemical Co., Ltd. (South Korea)
Joo Hyeon Park, Korea Kumho Petrochemical Co., Ltd. (South Korea)
Dong-Chul Seo, Korea Kumho Petrochemical Co., Ltd. (South Korea)
Chang-Min Kim, Korea Kumho Petrochemical Co., Ltd. (South Korea)
Young Tak Lim, Korea Kumho Petrochemical Co., Ltd. (South Korea)
Seung-duk Cho, Korea Kumho Petrochemical Co., Ltd. (South Korea)
Hyun-Sang Joo, Korea Kumho Petrochemical Co., Ltd. (South Korea)
Hyun Pyo Jeon, Korea Kumho Petrochemical Co., Ltd. (South Korea)
Seong-Ju Kim, Korea Kumho Petrochemical Co., Ltd. (South Korea)


Published in SPIE Proceedings Vol. 4690:
Advances in Resist Technology and Processing XIX
Theodore H. Fedynyshyn, Editor(s)

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