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Proceedings Paper

Spin coating and photolithography using liquid and supercritical carbon dioxide
Author(s): Erik N. Hoggan; Devin Flowers; Joseph M. DeSimone; Ruben G. Carbonell
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Paper Abstract

We discuss a new dry lithographic process using only carbon dioxide (CO2) as a solvent. Novel CO2 soluble photoresists were synthesized based on random copolymers of poly(1,1-dihydroperfluorooctyl)methacrylate 2-tetrahyrdopyranyl methacrylate. Photoresist spin casting, development, and stripping were all carried out in either liquid or supercritical CO2. We investigate such parameters as resist sensitivity, contrast, and resolution. The contrast of these resists has been evaluated using 248 nm exposures, and promising test images have been formed.

Paper Details

Date Published: 24 July 2002
PDF: 7 pages
Proc. SPIE 4690, Advances in Resist Technology and Processing XIX, (24 July 2002); doi: 10.1117/12.474199
Show Author Affiliations
Erik N. Hoggan, North Carolina State Univ. (United States)
Devin Flowers, Univ. of North Carolina/Chapel Hill (United States)
Joseph M. DeSimone, Univ. of North Carolina/Chapel Hill (United States)
Ruben G. Carbonell, North Carolina State Univ. (United States)


Published in SPIE Proceedings Vol. 4690:
Advances in Resist Technology and Processing XIX
Theodore H. Fedynyshyn, Editor(s)

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