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Proceedings Paper

Cycloolefin/cyanoacrylate (COCA) copolymers for 193-nm and 157-nm lithography
Author(s): Ralph R. Dammel; Raj Sakamuri; Sang-Ho Lee; Dalil Rahman; Takanori Kudo; Andrew R. Romano; Larry F. Rhodes; John-Henry Lipian; Cheryl Hacker; Dennis A. Barnes
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Paper Abstract

The copolymerization reaction between methyl cyanoacrylate (MCA) and a variety of cycloolefins (CO) was investigated. Cycololefin/cyanoacrylate (COCA) copolymers were obtained in good yields and with lithographically interesting molecular weights for all cycoolefins studied. Anionic MCA homopolymerization could be largely suppressed using acetic acid. Based on NMR data, the copolymerization may tend to a 1:1 CO:MCA incorporation ratio but further work with better suppression of the anionic component is needed to confirm this. Lithographic tests on copolymers of appropriately substituted norbornenes and MCA showed semi-dense and isolated line performance down to 90 nm.

Paper Details

Date Published: 24 July 2002
PDF: 9 pages
Proc. SPIE 4690, Advances in Resist Technology and Processing XIX, (24 July 2002); doi: 10.1117/12.474196
Show Author Affiliations
Ralph R. Dammel, Clariant Corp. (United States)
Raj Sakamuri, Clariant Corp. (United States)
Sang-Ho Lee, Clariant Corp. (United States)
Dalil Rahman, Clariant Corp. (United States)
Takanori Kudo, Clariant Corp. (United States)
Andrew R. Romano, Clariant Corp. (United States)
Larry F. Rhodes, Promerus Corp. (United States)
John-Henry Lipian, Promerus Corp. (United States)
Cheryl Hacker, Promerus Corp. (United States)
Dennis A. Barnes, Promerus Corp. (United States)

Published in SPIE Proceedings Vol. 4690:
Advances in Resist Technology and Processing XIX
Theodore H. Fedynyshyn, Editor(s)

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