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Proceedings Paper

Processing techniques for novel BARC chemistries
Author(s): Nickolas L. Brakensiek; Chris Cox; Rama Puligadda
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Paper Abstract

Previous generations of Bottom Anti-Reflective Coatings (BARCs) have had excellent optical properties but the etch performance for these BARC's were only 30% faster than the photoresist at best. A novel BARC chemistry has increased the capability of the photolithography process; this new chemistry has the capability to change etch and optical properties by the BARC bake process. This paper will present the bake process changes required to modify both etch characteristics and optical properties. Etch characteristics that were measured were bulk etch rate and etch selectivity to photoresist. Index of refraction and the absorption coefficients were measured for optical properties. Photolithography results focusing on Acetal and Hybrid photoresist types will be presented with specific attention to critical dimension control and focus latitude shifts, if any, associated with these BARC bake process changes.

Paper Details

Date Published: 24 July 2002
PDF: 9 pages
Proc. SPIE 4690, Advances in Resist Technology and Processing XIX, (24 July 2002); doi: 10.1117/12.474180
Show Author Affiliations
Nickolas L. Brakensiek, Brewer Science, Inc. (United States)
Chris Cox, Brewer Science, Inc. (United States)
Rama Puligadda, Brewer Science, Inc. (United States)


Published in SPIE Proceedings Vol. 4690:
Advances in Resist Technology and Processing XIX
Theodore H. Fedynyshyn, Editor(s)

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