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Proceedings Paper

Parameter extraction for 157-nm photoresists
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Paper Abstract

The design of 157nm photoresist is a daunting task since air, water, and most organic compounds are opaque at this wavelength. Spectroscopic studies led to the observation that fluorinated hydrocarbons improve the transparency of 157nm resist materials rather dramatically. These fluorinated resists have quickly become the prominent material platform for a variety of research activities. Regardless of wavelength, developing a practical photoresist material is always challenging; the added difficulties associated with 157nm radiation complicates the overall design problem and severely limits the choice of material classes to work with. This paper will discuss our 157nm simulation and parameter extraction efforts that have been completed over the past few months at International SEMATECH. During the past year we have developed the methodologies and practical test methods that are needed to study the lithographic behavior of 157nm resist systems. Our work is based on procedures in the open literature and augmented by internal research.

Paper Details

Date Published: 24 July 2002
PDF: 9 pages
Proc. SPIE 4690, Advances in Resist Technology and Processing XIX, (24 July 2002); doi: 10.1117/12.474174
Show Author Affiliations
Joseph J. Bendik, Dynamic Intelligence Inc. (United States)
Will Conley, International SEMATECH (United States)
Daniel A. Miller, International SEMATECH (United States)
Paul Zimmerman, International SEMATECH (United States)
Kim R. Dean, International SEMATECH (United States)
John S. Petersen, Petersen Advanced Lithography, Inc. (United States)
Jeff D. Byers, KLA-Tencor Corp. (United States)

Published in SPIE Proceedings Vol. 4690:
Advances in Resist Technology and Processing XIX
Theodore H. Fedynyshyn, Editor(s)

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