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Proceedings Paper

Comparison of plasma source with synchrotron source in the Center for X-ray Lithography
Author(s): Jerry Z.Y. Guo; Franco Cerrina
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Paper Abstract

The characteristics of sources for x-ray lithography are analyzed in terms of image formation. In particular, laser-induced plasma and synchrotron radiation sources are compared. New design considerations are presented for both types of sources, and we show that both can be good x-ray lithography sources in terms of image formation.

Paper Details

Date Published: 1 August 1991
PDF: 8 pages
Proc. SPIE 1465, Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing, (1 August 1991); doi: 10.1117/12.47377
Show Author Affiliations
Jerry Z.Y. Guo, Univ. of Wisconsin/Madison (United States)
Franco Cerrina, Univ. of Wisconsin/Madison (United States)


Published in SPIE Proceedings Vol. 1465:
Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing
Martin C. Peckerar, Editor(s)

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