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Proceedings Paper

Characterization of shape and deformation of MEMS by quantitative optoelectronic metrology techniques
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Paper Abstract

Recent technological trends based on miniaturization of mechanical, electro-mechanical, and photonic devices to the microscopic scale, have led to the development of microelectromechanical systems (MEMS). Effective development of MEMS components requires the synergism of advanced design, analysis, and fabrication methodologies, and also of quantitative metrology techniques for characterizing their performance, reliability, and integrity during the electronic packaging cycle. In this paper, we describe opto-electronic techniques for measuring, with sub-micrometer accuracy, shape and changes in states of deformation of MEMS strictures. With the described opto-electronic techniques, it is possible to characterize MEMS components using the display and data modes. In the display mode, interferometric information related to shape and deformation is displayed at video frame rates, providing the capability for adjusting and setting experimental conditions. In the data mode, interferometric information related to shape and deformation is recorded as high-spatial and high-digital resolution images, which are further processed to provide quantitative 3D information. Furthermore, the quantitative 3D data are exported to computer-aided design (CAD) environments and utilized for analysis and optimization of MEMS devices. Capabilities of opto- electronic techniques are illustrated with representative applications demonstrating their applicability to provide indispensable quantitative information for the effective development and optimization of MEMS devices.

Paper Details

Date Published: 19 June 2002
PDF: 10 pages
Proc. SPIE 4778, Interferometry XI: Applications, (19 June 2002); doi: 10.1117/12.473551
Show Author Affiliations
Cosme Furlong, Worcester Polytechnic Institute (United States)
Ryszard J. Pryputniewicz, Worcester Polytechnic Institute (United States)


Published in SPIE Proceedings Vol. 4778:
Interferometry XI: Applications
Wolfgang Osten, Editor(s)

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