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Proceedings Paper

Imaging interferometric microscopy for enhanced resolution
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Paper Abstract

Using the principle of imaging interferometry we resolve structures with a relatively low NA microscope objection which could not be resolved in the conventional illumination setup. We show experimental results for the cases of 700- and 4000-nm period gratings. We compare these results with theoretical simulations and estimate the maximum resolution potential. Also we evaluate further advantages of our approach, such as field of view and working distance.

Paper Details

Date Published: 16 July 2002
PDF: 10 pages
Proc. SPIE 4689, Metrology, Inspection, and Process Control for Microlithography XVI, (16 July 2002); doi: 10.1117/12.473526
Show Author Affiliations
Christian J. Schwarz, CHTM/Univ. of New Mexico (United States)
Yuliya Kuznetsova, CHTM/Univ. of New Mexico (United States)
Steven R. J. Brueck, CHTM/Univ. of New Mexico (United States)


Published in SPIE Proceedings Vol. 4689:
Metrology, Inspection, and Process Control for Microlithography XVI
Daniel J. C. Herr, Editor(s)

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