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Proceedings Paper

Metal characterization and process enhancement techniques for photolithographic materials
Author(s): Fu-Hsiang Ko; Hsuen-Li Chen; Chun-Chen Hsu; Tieh-Chi Chu
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Paper Abstract

A high-throughput, one-step microwave technique was developed for the dissolution of photolithographic materials. The effects of dissolution temperature and digestion acid volume on the dissolution efficiency were systematically evaluated. By combining the proposed microwave digestion and inductively coupled plasma mass spectrometry techniques, the detection limits int the sub- ppb level and the analytical throughput up to 14 samples per hour were achieved for the analysis of nine metals. The novel process of using the identical bottom antireflective coating (BARC) material was applied to the KrF and ArF photoresist systems to reduce swing effect and surface reflectance on the substrate. It was found that the optimal thickness of the BARC film for the KrF and ArF photoresist systems were 62.5 nm and 119 nm, respectively.

Paper Details

Date Published: 16 July 2002
PDF: 10 pages
Proc. SPIE 4689, Metrology, Inspection, and Process Control for Microlithography XVI, (16 July 2002); doi: 10.1117/12.473512
Show Author Affiliations
Fu-Hsiang Ko, National Nano Device Labs. (Taiwan)
Hsuen-Li Chen, National Nano Device Labs. (Taiwan)
Chun-Chen Hsu, National Tsinghua Univ. (Taiwan)
Tieh-Chi Chu, National Tsinghua Univ. (Taiwan)


Published in SPIE Proceedings Vol. 4689:
Metrology, Inspection, and Process Control for Microlithography XVI
Daniel J. C. Herr, Editor(s)

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