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Proceedings Paper

Optimization of an x-ray mask design for use with horizontal and vertical kinematic mounts
Author(s): Daniel L. Laird; Roxann L. Engelstad; Shane R. Palmer
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Paper Abstract

Kinematically mounted x-ray lithography masks are investigated to optimize various design parameters. Given the limited error budget for x-ray mask mounting, it is essential to minimize the mechanical distortions in the exposure area. Three-dimensional finite element models of the support ring with a membrane are used to analyze the gravitational effects for both the horizontal (e-beam patterning) and vertical mounting (synchrotron exposure). In-plane and out-of-plane distortions of the membrane are computed and the nodes in the patterned area are uniquely mapped. Results of the finite element calculations show that the mask distortions can be minimized by optimizing the design of the support ring in conjunction with the holding mechanism. The actual cross section of the ring is designed in correlation with the specifications on the position of the mount. Several design rules are developed from the analyses, relating the axis or rotation of the cross section with the radial position of the mount. Results of this study offer guidelines in choosing the optimum mask parameters considering the parametric designs presented.

Paper Details

Date Published: 1 August 1991
PDF: 11 pages
Proc. SPIE 1465, Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing, (1 August 1991); doi: 10.1117/12.47351
Show Author Affiliations
Daniel L. Laird, Univ. of Wisconsin/Madison (United States)
Roxann L. Engelstad, Univ. of Wisconsin/Madison (United States)
Shane R. Palmer, Texas Instruments Inc. (United States)


Published in SPIE Proceedings Vol. 1465:
Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing
Martin C. Peckerar, Editor(s)

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