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Proceedings Paper

Using carbon nanotube cantilevers in scanning probe metrology
Author(s): Rudy Schlaf; Yusuf Emirov; Jay A. Bieber; Arun Sikder; J. Kohlscheen; Deron A. Walters; Mohammed R. Islam; Bhavik Metha; Z. F. Ren; Terri L. Shofner; Benjamin B. Rossie; Michael W. Cresswell
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Paper Abstract

Carbon nanotubes (CNT) are among the candidates for atomic force microscopy probes for use in high aspect ratio critical dimension metrology (CDM). Their mechanical strength at small diameters makes them ideal probes for narrow and deep features. The synthesis of CNT has been making great progress in recent years. The use of CNT in scanning probe microscopy, however, has been limited due to a number of problems. While the CNT probes generally appear to be long lasting, the manufacture of precisely aligned CNT of defined length, diameter and number of walls poses a number of challenges. Yet, such precisely defined CNT probes seem to be required if the cantilevers are to be used for CDM. Our result demonstrate, for example, that the attachment angle of CNT with respect to the cantilever beam is crucial for their application in CDM. We report about our efforts to overcome these problems by growing well-defined CNT on standard Si cantilevers using chemical vapor deposition in combination with focused ion-beam machining techniques.

Paper Details

Date Published: 16 July 2002
PDF: 5 pages
Proc. SPIE 4689, Metrology, Inspection, and Process Control for Microlithography XVI, (16 July 2002); doi: 10.1117/12.473496
Show Author Affiliations
Rudy Schlaf, Univ. of South Florida (United States)
Yusuf Emirov, Univ. of South Florida (United States)
Jay A. Bieber, Univ. of South Florida (United States)
Arun Sikder, Univ. of South Florida (United States)
J. Kohlscheen, Univ. of South Florida (United States)
Deron A. Walters, Univ. of Central Florida (United States)
Mohammed R. Islam, Univ. of Central Florida (United States)
Bhavik Metha, Univ. of Central Florida (United States)
Z. F. Ren, Boston College (United States)
Terri L. Shofner, Agere Systems (United States)
Benjamin B. Rossie, Agere Systems (United States)
Michael W. Cresswell, National Institute of Standards and Technology (United States)


Published in SPIE Proceedings Vol. 4689:
Metrology, Inspection, and Process Control for Microlithography XVI
Daniel J. C. Herr, Editor(s)

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